Model of Collisional Sheath in Spherical and Cylindrical Geometries for Plasma Source Ion Implantation
WANG De-zhen, YU Jiong, GONG Ye
The Key National Laboratory of Materials Modification by Three Beams, And Department of Physics, Dalian University of Technology, Dalian 116024
Model of Collisional Sheath in Spherical and Cylindrical Geometries for Plasma Source Ion Implantation
WANG De-zhen;YU Jiong;GONG Ye
The Key National Laboratory of Materials Modification by Three Beams, And Department of Physics, Dalian University of Technology, Dalian 116024
关键词 ：
52.40.Hf ,
52.25.-b
Abstract ： A model is developed that describes the temporal evolution of the sheath during a pulse of high negative voltage applied to a spherical and cylindrical target in a plasma such as that present in plasma source ion implantation for the case in which the pressure of the neutral gas is large 4nough that the ion motion in the sheath can be assumed to he highly collisional. The analytic expressions of the sheath expanding ve1ocity are obtained. The positions of the sheath edge as a function of time predicted by the model are in agreement with those obtained by fluid equations.
Key words ：
52.40.Hf
52.25.-b
出版日期: 1996-02-01
:
52.40.Hf
(Plasma-material interactions; boundary layer effects)
52.25.-b
(Plasma properties)
引用本文:
WANG De-zhen;YU Jiong;GONG Ye. Model of Collisional Sheath in Spherical and Cylindrical Geometries for Plasma Source Ion Implantation[J]. 中国物理快报, 1996, 13(2): 117-120.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y1996/V13/I2/117
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1996, Vol. 13 
