Optical Probing of Free-Carrier Plasma Effects of MeV Ion
Implanted Silicon
YU Yuehui, ZOU Shichang, ZHOU Zhuyun1, ZHAO Guoqing1
Ion Beam Laboratory, Shanghai Institute of Metallurgy, Academia Sinica, Shanghai 200050
1Department of Nuclear Physics, Fudan University, Shanghai 200433
Optical Probing of Free-Carrier Plasma Effects of MeV Ion
Implanted Silicon
YU Yuehui;ZOU Shichang;ZHOU Zhuyun1;ZHAO Guoqing1
Ion Beam Laboratory, Shanghai Institute of Metallurgy, Academia Sinica, Shanghai 200050
1Department of Nuclear Physics, Fudan University, Shanghai 200433
Abstract： Boron ions have been implanted into silicon at an incident energy of 3 MeV to a dose of 5 x 1015 cm-2. Buried conductive layers have been formed in the silicon substrate after annealing at 1050°C for 20s. Infrared (IR) reflection spectrain the wavenumber range of 500-4000cm-1 have been measured and interference fringes related to free-carrier plasma effects observed. By detailed theoretical analysis and computer simulation of the IR reflection spectra, the depth profile of the carrier concentration, the carrier mobility near maximum carrier concentration, and the carrier activation efficiency have been obtained. The physical interpretation of the results was given.
1995, Vol. 12 
