Self-Assembled Monolayers Exposed by Metastable Helium for Nano-Patterning: Octanethiol and Dodecanethiol

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	JU Xin
	KURAHASHI Mitsunori
	SUZUKI Taku
	YAMAUCHI Yasushi

关键词 ： 81.16.Nd, 81.16.Dn, 61.80.Lj

Abstract： A large-area gold pattern with nanoscale edge on muscovite mica was fabricated by using a metastable helium beam and octanethiol (OT) and dodecanethiol (DDT) self-assembled monolayers (SAM), in which the width of edge was typically ～70 nm for the OT SAM and ～90 nm for the DDT SAM, respectively. The mask was reproduced with high fidelity. Combined the analysis of roughness with grain size, more flat surface and sharper edge of patterns were obtained by using the shorter chain molecules such as the OT. All the information indicated that the OT SAMs on atomically flat surfaces can be used as a resist for exposure to metastable atom beams.

Key words： 81.16.Nd 81.16.Dn 61.80.Lj

出版日期: 2003-11-01

:	81.16.Nd	(Micro- and nanolithography)
	81.16.Dn	(Self-assembly)
	61.80.Lj	(Atom and molecule irradiation effects)

引用本文:

JU Xin;KURAHASHI Mitsunori;SUZUKI Taku;YAMAUCHI Yasushi. Self-Assembled Monolayers Exposed by Metastable Helium for Nano-Patterning: Octanethiol and Dodecanethiol[J]. 中国物理快报, 2003, 20(11): 2064-2066.
JU Xin, KURAHASHI Mitsunori, SUZUKI Taku, YAMAUCHI Yasushi. Self-Assembled Monolayers Exposed by Metastable Helium for Nano-Patterning: Octanethiol and Dodecanethiol. Chin. Phys. Lett., 2003, 20(11): 2064-2066.

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https://cpl.iphy.ac.cn/CN/ 或 https://cpl.iphy.ac.cn/CN/Y2003/V20/I11/2064