Influence of Combination of Casimir Force and Residual Stress on the Behaviour of Micro- and Nano-Electromechanical Systems
ZHENG Mao-Sheng, ZHOU Gen-Shu, ZHAO Wen-Zhen, GU Hai-Cheng
State Key Laboratory for Mechanical Behavior of Materials,
Xi’an Jiaotong University, Xi’an 710049
Influence of Combination of Casimir Force and Residual Stress on the Behaviour of Micro- and Nano-Electromechanical Systems
ZHENG Mao-Sheng;ZHOU Gen-Shu;ZHAO Wen-Zhen;GU Hai-Cheng
State Key Laboratory for Mechanical Behavior of Materials,
Xi’an Jiaotong University, Xi’an 710049
关键词 ：
62.20.-x ,
62.20.Dc ,
62.20.Fe ,
62.20.Mk ,
83.50.-v
Abstract ： Casimir force and residual stresses actually appear in over-layers or films simultaneously, the study of the behaviour of micro-/nano-electromechanical systems in the presence of Casimir force and residual stress is of significance to the design of the relevant devices. We derive analytical expressions of the deflection of a bridge shaped device under the mutual actions of Casimir force and residual stress in films. It is shown that the tensile residual stress enhances wavy behaviour of the deflection, while the compressive residual stress increases the deflection value and reduces the wavy behaviour.
Key words ：
62.20.-x
62.20.Dc
62.20.Fe
62.20.Mk
83.50.-v
出版日期: 2002-06-01
引用本文:
ZHENG Mao-Sheng;ZHOU Gen-Shu;ZHAO Wen-Zhen;GU Hai-Cheng. Influence of Combination of Casimir Force and Residual Stress on the Behaviour of Micro- and Nano-Electromechanical Systems[J]. 中国物理快报, 2002, 19(6): 832-834.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2002/V19/I6/832
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