1Key Laboratory of Soft Matter Chemistry, Department of Polymer Science and Engineering, University of Science and Technology of China, Hefei 230026 2Department of Electronic Engineering and Information Science, University of Science and Technology of China, Hefei 230026 3Key Laboratory of Quantum Information, Department of Optics and Optical Engineering, University of Science and Technology of China, Hefei 230026 4 Anhui Key Laboratory of Optoelectronic Science and Technology, University of Science and Technology of China, Hefei 230026
Effect of Zeroth-Order beam on Azobenzene Polymer Surface Relief Gratings Fabricated by Phase-Mask Method
1Key Laboratory of Soft Matter Chemistry, Department of Polymer Science and Engineering, University of Science and Technology of China, Hefei 230026 2Department of Electronic Engineering and Information Science, University of Science and Technology of China, Hefei 230026 3Key Laboratory of Quantum Information, Department of Optics and Optical Engineering, University of Science and Technology of China, Hefei 230026 4 Anhui Key Laboratory of Optoelectronic Science and Technology, University of Science and Technology of China, Hefei 230026
In the fabrication of surface relief gratings (SRGs) on azobenzene polymer films with a zeroth-order suppressed diffraction phase mask, it is found that the SRGs' relief figure and period change with the irradiation time, and the period is doubled after a critical time. The time dependence of the changes in the SRG forming process is investigated by theoretical analysis and experiments. An optimum time range for inscription of the sub-micron SRGs is determined to be 5-8 min in terms of both the theoretical and experimental results.
In the fabrication of surface relief gratings (SRGs) on azobenzene polymer films with a zeroth-order suppressed diffraction phase mask, it is found that the SRGs' relief figure and period change with the irradiation time, and the period is doubled after a critical time. The time dependence of the changes in the SRG forming process is investigated by theoretical analysis and experiments. An optimum time range for inscription of the sub-micron SRGs is determined to be 5-8 min in terms of both the theoretical and experimental results.
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2010, Vol. 27 
