Dependence of Secondary Ion Mass Spectrometry Relative Sensitivity Factor on Matrix
YANG De-quan, FAN Chui-zhen
Laboratory of Applied Surface Physics, Lanzhou Institute of Physics, Chinese Academy of Space Technology, Lanzhou 730000
Dependence of Secondary Ion Mass Spectrometry Relative Sensitivity Factor on Matrix
YANG De-quan;FAN Chui-zhen
Laboratory of Applied Surface Physics, Lanzhou Institute of Physics, Chinese Academy of Space Technology, Lanzhou 730000
关键词 ：
82.80.Ms ,
78.30.Am ,
79.20.Rf
Abstract ： In secondary ion mass spectrometry, we define the slope of logarithm of relative sensitivity factor versus ionization potential as matrix effect factor. It was found that the matrix effect factor is dependent on the average atomic number and average electronegative values, as well as average oxide formation heat of matrix. The "combined local thermal equilibrium model and bond-breaking'' model proposed by us early was used to explain this dependence.
Key words ：
82.80.Ms
78.30.Am
79.20.Rf
出版日期: 1998-09-01
:
82.80.Ms
(Mass spectrometry (including SIMS, multiphoton ionization and resonance ionization mass spectrometry, MALDI))
78.30.Am
(Elemental semiconductors and insulators)
79.20.Rf
(Atomic, molecular, and ion beam impact and interactions with surfaces)
引用本文:
YANG De-quan;FAN Chui-zhen. Dependence of Secondary Ion Mass Spectrometry Relative Sensitivity Factor on Matrix[J]. 中国物理快报, 1998, 15(9): 697-699.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y1998/V15/I9/697
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