Ultraviolet Photoelectron Spectroscopy Study of Oxygen Adsorption on Rb-Covered InSb (111) Surfaces
WU Jian-xin, MA Mao-sheng, LIU Xian-ming
Structure Research Laboratory, University of Science and Technology of China, Hefei 230026
Ultraviolet Photoelectron Spectroscopy Study of Oxygen Adsorption on Rb-Covered InSb (111) Surfaces
WU Jian-xin;MA Mao-sheng;LIU Xian-ming
Structure Research Laboratory, University of Science and Technology of China, Hefei 230026
关键词 ：
79.60.Dp ,
73.30.+y ,
82.65.-i
Abstract ： Oxygen adsorption on Rb-covered InSb(111) surface has been studied at room temperature as a function of Rb coverage using ultraviolet photoelectron spectroscopy. At low O2 exposures, the intensity ratio of O2- 2 to O2- increases with Rb coverage. The surfaces with low Rb coverages are mainly covered by Sb oxides, causing an increase of work function. For high Rb coverages, the Sb atoms are oxidized below a thin layer of Rb peroxide, which is related to an initial decrease of the work function. At high O2 exposures, the intensity of O- 2 ion increases with Rb coverage.
Key words ：
79.60.Dp
73.30.+y
82.65.-i
出版日期: 1998-08-01
:
79.60.Dp
(Adsorbed layers and thin films)
73.30.+y
(Surface double layers, Schottky barriers, and work functions)
82.65.-i
引用本文:
WU Jian-xin;MA Mao-sheng;LIU Xian-ming. Ultraviolet Photoelectron Spectroscopy Study of Oxygen Adsorption on Rb-Covered InSb (111) Surfaces[J]. 中国物理快报, 1998, 15(8): 605-607.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y1998/V15/I8/605
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