Investigation of Preparing Cubic Boron Nitride Films by Magnetron Arc-Discharge Plasma Ion Plating
ZHAO Yong-nian1,2 , HE Zhi1 , WANG Bo1 ,TAO Yan-chun2 , ZOU Guang-tian1
1 State Key Laboratory for Superhard Materials, Jilin University, Changchun 130023
2 Key Laboratory for Supramolecular Structure and Spectroscopy, Jilin University, Changchun 130023
Investigation of Preparing Cubic Boron Nitride Films by Magnetron Arc-Discharge Plasma Ion Plating
ZHAO Yong-nian1,2 ;HE Zhi1 ;WANG Bo1 ,TAO Yan-chun2 ;ZOU Guang-tian1
1 State Key Laboratory for Superhard Materials, Jilin University, Changchun 130023
2 Key Laboratory for Supramolecular Structure and Spectroscopy, Jilin University, Changchun 130023
关键词 ：
81.15.Jj ,
81.15.Np ,
52.80.Vp
Abstract ： A method of synthesizing cubic boron nitride (c-BN) films by the magnetron arc-discharge plasma ion plating was investigated. A nearly pure c-BN film was obtained by reacting boron vapor with high-density nitrogen ions, and using hot cathode arc-discharge plasma in a parallel magnetic field around the substrate. The structure of the films obtained was characterized by using infrared absorption spectroscopy and x-ray diffraction analysis. After numerous experiments, the phase pattern of the bias vs the current in synthesizing c-BN was found.
Key words ：
81.15.Jj
81.15.Np
52.80.Vp
出版日期: 1998-03-01
:
81.15.Jj
(Ion and electron beam-assisted deposition; ion plating)
81.15.Np
(Solid phase epitaxy; growth from solid phases)
52.80.Vp
(Discharge in vacuum)
引用本文:
ZHAO Yong-nian;HE Zhi;WANG Bo;TAO Yan-chun;ZOU Guang-tian
. Investigation of Preparing Cubic Boron Nitride Films by Magnetron Arc-Discharge Plasma Ion Plating[J]. 中国物理快报, 1998, 15(3): 230-231.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y1998/V15/I3/230
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1998, Vol. 15 
