A Study of Field Electron Emission from Thin Amorphous-Carbon-Nitride Films
CHEN Jun1, XU Ning-sheng1,2, WANG En-ge2, DENG Shao-zhi1, CHEN Di-hu1, WEI Ai-xiang1
1Department of Physics, Zhongshan University, Guangzhou 510275
2State Key Laboratory for Surface Science, Institute of Physics, Chinese Academy of Sciences, Beijing 100080
A Study of Field Electron Emission from Thin Amorphous-Carbon-Nitride Films
1Department of Physics, Zhongshan University, Guangzhou 510275
2State Key Laboratory for Surface Science, Institute of Physics, Chinese Academy of Sciences, Beijing 100080
Abstract： Significant field emission has been observed from thin (< 1000 Å) amorphous-carbon-nitride (a-CN) films. X-ray photoelectron spectroscopy, infrared spectrometry, and UV-visible optical absorption spectrometry have been used to characterize the films. The field emission properties of the thin film have been studied by using a transparent anode imaging system. It is proposed that this class of films should be studied as candidates of coating material for cold cathode emitter, in order for one to benefit from their very high thermal conductivity and super hardness.
CHEN Jun;XU Ning-sheng;WANG En-ge;DENG Shao-zhi;CHEN Di-hu;WEI Ai-xiang. A Study of Field Electron Emission from Thin Amorphous-Carbon-Nitride Films[J]. 中国物理快报, 1998, 15(7): 539-541.
CHEN Jun, XU Ning-sheng, WANG En-ge, DENG Shao-zhi, CHEN Di-hu, WEI Ai-xiang. A Study of Field Electron Emission from Thin Amorphous-Carbon-Nitride Films. Chin. Phys. Lett., 1998, 15(7): 539-541.
1998, Vol. 15 
