Stability of Mo/Si Multilayer Structure Used in Bragg-Fresnel Optics
LE Zi-chun, CAO Jian-lin, LIANG Jing-qiu, PEI Shu, YAO Jin-song, CUI Cheng-jia, LI Xing-lin1
Changchun Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Changchun 130022
Present address: Institute of Atomic and Molecular Physics, Jilin University, Changchun 130023
1Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022
Stability of Mo/Si Multilayer Structure Used in Bragg-Fresnel Optics
LE Zi-chun;CAO Jian-lin;LIANG Jing-qiu;PEI Shu;YAO Jin-song;CUI Cheng-jia;LI Xing-lin1
Changchun Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Changchun 130022
Present address: Institute of Atomic and Molecular Physics, Jilin University, Changchun 130023
1Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022
Abstract： The thermal and chemical stabilities of Mo/Si multilayer structure used in Bragg-Fresnel optics were studied to get optimal technological parameters of pattern generation. Mo/Si multilayers were annealed at temperature ranging from 360 to 770 K, treated with acetone and 5‰ NaOH solution, and characterized by small-angle x-ray diffraction technique as well as x-ray photoelectron spectroscopy and Olympus microscopy.
LE Zi-chun;CAO Jian-lin;LIANG Jing-qiu;PEI Shu;YAO Jin-song;CUI Cheng-jia;LI Xing-lin. Stability of Mo/Si Multilayer Structure Used in Bragg-Fresnel Optics[J]. 中国物理快报, 1998, 15(7): 522-524.
LE Zi-chun, CAO Jian-lin, LIANG Jing-qiu, PEI Shu, YAO Jin-song, CUI Cheng-jia, LI Xing-lin. Stability of Mo/Si Multilayer Structure Used in Bragg-Fresnel Optics. Chin. Phys. Lett., 1998, 15(7): 522-524.
1998, Vol. 15 
