Effects of Chamber Pressure on Current-Voltage Characteristic of Metal-Insulator-Metal Element in Heat-Treating Anodized Ta2O5 Film
LIU Hong-wu1, GAO Chun-xiao1,2, WANG Hui1, CUI Qi-liang1, ZOU Guang-tian1, HUANG Xi-min3
1State Key Laboratory for Superhard Materials, Jilin University, Changchun 130023
2Institute of Physics, Chinese Academy of Sciences, Beijing 100080
3Changchun Institute of Physics, Chinese Academy of Sciences, Changcun 130021
Effects of Chamber Pressure on Current-Voltage Characteristic of Metal-Insulator-Metal Element in Heat-Treating Anodized Ta2O5 Film
LIU Hong-wu1;GAO Chun-xiao1,2;WANG Hui1;CUI Qi-liang1;ZOU Guang-tian1;HUANG Xi-min3
1State Key Laboratory for Superhard Materials, Jilin University, Changchun 130023
2Institute of Physics, Chinese Academy of Sciences, Beijing 100080
3Changchun Institute of Physics, Chinese Academy of Sciences, Changcun 130021
Abstract： Ta/anodized Ta2O5/Al is used as metal-insulator-metal (MIM) element in experiments, The current- voltage (I- V) characteristic of the MIM element depends on the chamber pressure in heat-treating anodized Ta2O5 film. Good nonlinear I- V characteristic has been obtained in the pressure range from 10-2 to 10-4 to Torr. Meanwhile, the conductivity coefficient α of the Poole-frenkel (PF) equation which describes the I- V characteristic can be regulated by about two orders of magnitude in this pressure range, while the non-linearity coefficient β of the PF equation is not affected by the chamber pressure.
LIU Hong-wu;GAO Chun-xiao;WANG Hui;CUI Qi-liang;ZOU Guang-tian;HUANG Xi-min. Effects of Chamber Pressure on Current-Voltage Characteristic of Metal-Insulator-Metal Element in Heat-Treating Anodized Ta2O5 Film
[J]. 中国物理快报, 1999, 16(11): 838-840.
LIU Hong-wu, GAO Chun-xiao, WANG Hui, CUI Qi-liang, ZOU Guang-tian, HUANG Xi-min. Effects of Chamber Pressure on Current-Voltage Characteristic of Metal-Insulator-Metal Element in Heat-Treating Anodized Ta2O5 Film
. Chin. Phys. Lett., 1999, 16(11): 838-840.
1999, Vol. 16 
