Tuning of the Magnetic Damping Parameter by Varying Cr Composition in Fe$_{1-x}$Cr$_x$ Alloy
Mao Yang1,2†, Xianyang Lu1†, Bo Liu1, Xuezhong Ruan1*, Junran Zhang1, Xiaoqian Zhang1, Dawei Huang1, Jing Wu3, Jun Du4, Bo Liu5, Hao Meng5, Liang He1*, and Yongbing Xu1,3*
1Jiangsu Provincial Key Laboratory of Nanotechnology, School of Electronics Science and Engineering, Nanjing University, Nanjing 210093, China 2College of Physics and Electronic Information, Luoyang Normal University, Luoyang 471022, China 3York-Nanjing International Joint Center in Spintronics, Departments of Electronics and Physics, University of York, York YO10 5DD, UK 4Department of Physics, Nanjing University, Nanjing 210093, China 5Key Laboratory of Spintronics Materials, Devices and Systems of Zhejiang Province, 9 Lixin Road, Linan, Hangzhou 311300, China
Abstract:We investigate the magnetic damping parameter of Fe$_{1-x}$Cr$_x$ thin films using the time-resolved magneto-optical Kerr effect technique. It is demonstrated that the overall effective damping parameter is enhanced with the increasing Cr concentration. The effective damping at high field $\alpha_{0}$ is found to be significantly enhanced when increasing the Cr concentration with the $\alpha_{0}=0.159$ in the Fe$_{45}$Cr$_{55}$ enhanced by 562% compared with that of $\alpha_{0}=0.024$ in the pure Fe film. This study provides a new approach of controlling the effective damping parameter with a desired magnitude via varying Cr composition.
. [J]. 中国物理快报, 2020, 37(10): 107502-.
Mao Yang, Xianyang Lu, Bo Liu, Xuezhong Ruan, Junran Zhang, Xiaoqian Zhang, Dawei Huang, Jing Wu, Jun Du, Bo Liu, Hao Meng, Liang He, and Yongbing Xu. Tuning of the Magnetic Damping Parameter by Varying Cr Composition in Fe$_{1-x}$Cr$_x$ Alloy. Chin. Phys. Lett., 2020, 37(10): 107502-.
Liu B, Niu W, Chen Y, Ruan X, Tang Z, Wang X, Liu W, He L, Li Y, Wu J, Tang S, Du J, Zhang R and Xu Y 2019 Adv. Mater.31 e1806443
[8]
Lu X, Atkinson L J, Kuerbanjiang B, Liu B, Li G, Wang Y, Wang J, Ruan X, Wu J, Evans R F L, Lazarov V K, Chantrell R W and Xu Y 2019 Appl. Phys. Lett.114 192406