Chin. Phys. Lett.  2008, Vol. 25 Issue (1): 202-204    DOI:
Original Articles |
A Microfabricated Inductively Coupled Plasma Excitation Source
WANG Yong-Qing1,2;PU Yong-Ni1;SUN Rong-Xia1;TANG Yu-Jun1;CHEN Wen-Jun1;LOU Jian-Zhong1;MA Wen3
1College of Electronic and Informational Engineering, Hebei University, Baoding 0710022Central Iron and Steel Research Institute, National Testing Center of Iron and Steel, Beijing 1000813Chinese People's Armed Police Forces Academy, Langfang 065000
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WANG Yong-Qing, PU Yong-Ni, SUN Rong-Xia et al  2008 Chin. Phys. Lett. 25 202-204
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Abstract A novel miniaturization of inductively coupled plasma (ICP) source based on printed circuit produced using micro-fabrication techniques is presented. The basic parameters of the novel ICP, including its radio frequency, power loss, size, and argon consumption are less than 1% of that for the case of atmospheric pressure ICP source. For example, at 100Pa of argon gas pressure, the present ICP source can be ignited by using the rf power less than 3.5W. Potential applications of the ICP is discussed.
Keywords: 52.80.Yr      52.50.Dg     
Received: 02 March 2007      Published: 27 December 2007
PACS:  52.80.Yr (Discharges for spectral sources)  
  52.50.Dg (Plasma sources)  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y2008/V25/I1/0202
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Articles by authors
WANG Yong-Qing
PU Yong-Ni
SUN Rong-Xia
TANG Yu-Jun
CHEN Wen-Jun
LOU Jian-Zhong
MA Wen
[1] Ju H and Wu Y H 2001 Optics and PrecisionEngineering 9 372 (in Chinese).
[2] Ju H and Wu Y H 2003 Micronanoelectronic Technology No 1 p 30 (in Chinese)
[3] Ju H and Wu Y H 2001 Chin. J. Scientific Instrument 22 131 (in Chinese)
[4] Wang Y Q, Ma W et al 2006 Metallurgical Analysis 26 40 (in Chinese)
[5] Hopwood J 2000 J. Microelectromech. Systems 9309
[6]Gu Q Z, Xiang J Z and Yuan X K 1978 The Designs ofMicrowave Integrated Circuit (Beijing: Posts and TelecommunicationsPress) chap 1.1 (in Chinese)
[7] Hopwood J, Minayeva O and Yin Y 2000 J. Vacuum Sci.Technol. B: Microelectron. Nanometer Structures 18 2446
[8] Wang Y Q, Ma W, Lou J Z et al 2005 The 7thInternational Conference on Electronic Measurement andInstruments (Beijing 16--18 August 2005)
[9] Yin Y, Messier J and Hopwood J 1999 IEEE Trans.Plasma Sci. 27 1516
[10] Hopwood J A and McGruer Nhttp://www.ece.neu.edu/ed\\*snu/hopwood/tampa-proceedings.pdf
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