Chin. Phys. Lett.  2007, Vol. 24 Issue (3): 774-777    DOI:
Original Articles |
Growth of AlGaN Epitaxial Film with High Al Content by Metalorganic Chemical Vapour Deposition
WANG Xiao-Lan;ZHAO De-Gang;YANG Hui;LIANG Jun-Wu
State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing
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WANG Xiao-Lan, ZHAO De-Gang, YANG Hui et al  2007 Chin. Phys. Lett. 24 774-777
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Abstract A high-Al-content AlGaN epilayer is grown on a low-temperature-deposited AlN buffer on (0001) sapphire by low pressure metalorganic chemical vapour deposition. The dependence of surface roughness, tilted mosaicity, and twisted mosaicity on the conditions of the AlGaN epilayer deposition is evaluated. An AlGaN epilayer with favourable surface morphology and crystal quality is deposited on a 20nm low-temperature-deposited AlN buffer at a low V/III flow ratio of 783 and at a low reactor pressure of 100Torr, and the adduct reaction between trimethylaluminium and NH3 is considered.
Keywords: 61.10.Nz      61.16.Ch      81.15.Gh     
Received: 21 November 2006      Published: 08 February 2007
PACS:  61.10.Nz  
  61.16.Ch  
  81.15.Gh (Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y2007/V24/I3/0774
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WANG Xiao-Lan
ZHAO De-Gang
YANG Hui
LIANG Jun-Wu
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