Chin. Phys. Lett.  2006, Vol. 23 Issue (6): 1533-1535    DOI:
Original Articles |
Deposition of TiN Films by Novel Filter Cathodic Arc Technique
NIU Er-Wu;FAN Song-Hua;LI Li;LU Guo-Hua;FENG Wen-Ran;ZHANG Gu-Ling;YANG Si-Ze
Institute of Physics, Chinese Academy of Sciences, Beijing 100080
Cite this article:   
NIU Er-Wu, FAN Song-Hua, LI Li et al  2006 Chin. Phys. Lett. 23 1533-1535
Download: PDF(211KB)  
Export: BibTeX | EndNote | Reference Manager | ProCite | RefWorks
Abstract A straight magnetic filtering arc source is used to deposit thin films of titanium nitride. The properties of the films depend strongly on the deposition process. TiN films can be deposited directly onto heated substrates in a nitrogen atmosphere or onto unbiased substrates by condensing the Ti+ ion beam in about 300eV N2+ nitrogen ion bombardment. In the latter case, the film stoichiometry is varied from an N:Ti ratio of 0.6--1.1 by controlling the arrival rates of Ti and nitrogen ions. Meanwhile, simple models are used to describe the evolution of compressive stress as function of the arrival ratio and the composition of the ion-assisted TiN films.
Keywords: 52.77.-j      52.75.-d      61.82.Bg     
Published: 01 June 2006
PACS:  52.77.-j (Plasma applications)  
  52.75.-d (Plasma devices)  
  61.82.Bg (Metals and alloys)  
TRENDMD:   
URL:  
https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y2006/V23/I6/01533
Service
E-mail this article
E-mail Alert
RSS
Articles by authors
NIU Er-Wu
FAN Song-Hua
LI Li
LU Guo-Hua
FENG Wen-Ran
ZHANG Gu-Ling
YANG Si-Ze
Related articles from Frontiers Journals
[1] LIU Feng, WANG Wei-Wei, CHANG Xi-Jiang, LIANG Rong-Qing** . Preliminary Investigation of a Dielectric Barrier Discharge Lamp in Open Air at Atmospheric Pressure[J]. Chin. Phys. Lett., 2011, 28(8): 1533-1535
[2] ZHANG Yu-Tao**, GUO Ying, MA Teng-Cai . Plasma Catalytic Synthesis of Silver Nanoparticles[J]. Chin. Phys. Lett., 2011, 28(10): 1533-1535
[3] XU Guo-Liang, ZHANG Dong-Ling, XIA Yao-Zheng, LIU Xue-Feng, LIU Yu-Fang, ZHANG Xian-Zhou. Theoretical Study of Elastic Properties of Tungsten Disilicide[J]. Chin. Phys. Lett., 2009, 26(4): 1533-1535
[4] HUNDUR Yakup, GUVENC Ziya B, HIPPLER Rainer. Dynamical Analysis of Sputtering at Threshold Energy Range: Modelling of Ar+Ni(100) Collision System[J]. Chin. Phys. Lett., 2008, 25(2): 1533-1535
[5] ZHANG Yue-Zong, FENG Shi-Wei, GUO Chun-Sheng, ZHANG Guang-Chen, ZHUANG Si-Xiang, SU Rong, BAI Yun-Xia, LU Chang-Zhi. High-Temperature Characteristics of Ti/Al/Ni/Au Ohmic Contacts to n-GaN[J]. Chin. Phys. Lett., 2008, 25(11): 1533-1535
[6] YIN Long-Cheng, LUAN Sen, LV Guo-Hua, WANG Xing-Quan, HUANG Jun, JIN Hui, FENG Ke-Cheng, YANG Si-Ze. Effect of Silane Flow Rate on Structure and Corrosion Resistance of Ti-Si-N Thin Films Deposited by a Hybrid Cathodic Arc and Chemical Vapour Process[J]. Chin. Phys. Lett., 2008, 25(11): 1533-1535
[7] LI Xiang-Zhou, ZHANG Xian-Hui, HE Ping, NIU Er-Wu, XIA Yuan-Yu, HUANG Jun, FENG Ke-Cheng, YANG Si-Ze. Effect of Substrate Bias on Microstructures of Zirconia Thin Films Deposited by Cathodic Vacuum Arc[J]. Chin. Phys. Lett., 2007, 24(6): 1533-1535
[8] LIU Ti-Jiang, WANG Yue-Xia**, PAN Zheng-Ying, JIANG Xiao-Mei, ZHOU-Liang, ZHU Jing. Atomistic Simulation of He Clustering and Defects Produced in Ni[J]. Chin. Phys. Lett., 2006, 23(5): 1533-1535
[9] LI Li, NIU Er-Wu, LV Guo-Hua, FENG Wen-Ran, GU Wei-Chao, CHEN Guang-Liang, ZHANG Gu-Ling, FAN Song-Hua, LIU Chi-Zi, YANG Si-Ze. Preparation and Microstructure of Tantalum Nitride Thin Film by Cathodic Arc Deposition[J]. Chin. Phys. Lett., 2006, 23(11): 1533-1535
[10] LIU Xiu-Jun, CHEN Guang-Liang, CHEN Shi-Hua, QIAN Feng, FENG Ke-Cheng, YANG Si-Ze. Removal of NO Molecules by a Novel Atmospheric Pressure Plasma Apparatus[J]. Chin. Phys. Lett., 2006, 23(10): 1533-1535
[11] XU Ming-Chun, QIAN Hai-Jie, LIU Feng-Qin, KRASH Ibrahim, LA Wu-Yan, WU Si-Cheng. Surface Alloying of Submonolayer Pb on Cu(ll1) Studied by Photoemission[J]. Chin. Phys. Lett., 2000, 17(1): 1533-1535
[12] CHEN Guang-chao, DU Xiao-long, JIANG De-yi, YAO Xin-zi. Application of Electron Cyclotron Resonance Assisted Plasma in GaN Deposition[J]. Chin. Phys. Lett., 1998, 15(10): 1533-1535
[13] WANG Xi-lu*, Akira Mizuno, Shijin Katsura. A Novel Sterilization Method Using Pulsed Discharge Plasma [J]. Chin. Phys. Lett., 1998, 15(1): 1533-1535
[14] ZHANG Hai-feng, MA Yu-guang, TIAN Wen-jing, SHEN Jia-cong, TANG Jian-guo*, LIU Shi-yong*. Photoluminescence and Electroluminescence from Plasma Ploymerized Naphthalene Films[J]. Chin. Phys. Lett., 1996, 13(10): 1533-1535
[15] YAN Pengxun, YANG Si-ze, YANG Jie, LI Qing, LI Bing, LIU Chizi, CHEN Xishen. High-Power-Density Plasma Deposition of Diamond-Like Carbons Films [J]. Chin. Phys. Lett., 1994, 11(9): 1533-1535
Viewed
Full text


Abstract