| Original Articles |
|
|
|
|
Atom Lithography with a Chromium Atomic Beam |
| ZHANG Wen-Tao1,2;LI Tong-Bao1 |
| 1Department of Physics, Tongji University, Shanghai 200092
2Department of Electronic Engineering, Guilin University of Electronic Technology, Guilin 541004 |
|
| Cite this article: |
|
ZHANG Wen-Tao, LI Tong-Bao 2006 Chin. Phys. Lett. 23 2952-2955 |
|
|
|
|
Abstract Direct write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms deposit on the substrate. We design an experiment setup to fabricate chromium nanolines by depositing an atomic beam of 52Cr through an off-resonant laser standing wave with the wavelength of 425.55nm onto a silicon substrate. The resulting nanolines exhibit a period of 215±3nm with height of 1nm.
|
| Keywords:
32.80.-t
32.80.Pj
|
|
|
Published: 01 November 2006
|
|
|
|
|
|
|
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
