Chin. Phys. Lett.  2004, Vol. 21 Issue (8): 1644-1647    DOI:
Original Articles |
Optical Field Measurement of Nano-Apertures with a Scanning Near-Field Optical Microscope
XU Tie-Jun;XU Ji-Ying;WANG Jia;TIAN Qian
State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instruments, Tsinghua University, Beijing 100084
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XU Tie-Jun, XU Ji-Ying, WANG Jia et al  2004 Chin. Phys. Lett. 21 1644-1647
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Abstract We investigate optical near-field distributions of the unconventional C-apertures and the conventional square apertures in preliminary experiment with an aperture scanning near-field optical microscope. These nano-apertures are fabricated in Au film on a glass substrate with focused ion beam technology. The experimental results indicate the uptrend of output light intensity that a C-aperture enables the intensity maximum to increase at least 10 times more than a square aperture with same unit length. The measured near-field light spot sizes of C-aperture and square aperture with 200-nm unit length are 439nm×500nm and 245nm×216nm, respectively.
Keywords: 78.67.-n      07.79.Fc      68.37.Uv     
Published: 01 August 2004
PACS:  78.67.-n (Optical properties of low-dimensional, mesoscopic, and nanoscale materials and structures)  
  07.79.Fc (Near-field scanning optical microscopes)  
  68.37.Uv (Near-field scanning microscopy and spectroscopy)  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y2004/V21/I8/01644
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