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Effects of Rapid Cycle Annealing Temperature on TbFe Magnetostrictive Films |
| JIANG Hong-Chuan;ZHANG Jin-Ping;ZHANG Wan-Li;PENG Bin;ZHANG Wen-Xu;YANG Shi-Qing;ZHANG Huai-Wu |
| College of Microelectronics and Solid State Electronics, University of Electronic Science and Technology of China, Chengdu 610054 |
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| Cite this article: |
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JIANG Hong-Chuan, ZHANG Jin-Ping, ZHANG Wan-Li et al 2004 Chin. Phys. Lett. 21 1624-1627 |
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Abstract The effects of annealing temperature on TbFe films prepared by dc magnetron sputtering were discussed. X-ray diffraction patterns indicate that these polycrystalline films consisting mainly of α-Fe and TbFe2 lave phase with grain sizes less than 25nm can be obtained by a rapid cycle annealing process. Grain sizes can be controlled by varying annealing temperatures. Film hysteresis loop studies show that annealing treatment can improve TbFe film in-plane soft magnetic performances. Magnetic domain structures explored by a magnetic force microscopy show that in the as-deposited films, maze domain structures exist, hence it possesses perpendicular anisotropy and larger anisotropic constant Ku. No domains are observed when annealing temperature is lower than 400°C. However, maze domain structures appear again when annealing temperature is higher than 400°C. Two maxima of magnetostrictive coefficients are obtained at annealing temperatures of 300°C and 500°C in the presence of a 40kA.m-1 external magnetic field.
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| Keywords:
75.50.Bb
75.60.Nt
75.75.+a
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Published: 01 August 2004
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