Chin. Phys. Lett.  2004, Vol. 21 Issue (11): 2242-2244    DOI:
Original Articles |
Photoluminescence of Dislocations in Nitrogen Doped Czochralski Silicon
LI Dong-Sheng1;YANG De-Ren1;E. Leoni2;S. Binetti2;S. Pizzini2
1State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027 2INFM and University of Milano Bicocca, Milan, Italy
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LI Dong-Sheng, YANG De-Ren, E. Leoni et al  2004 Chin. Phys. Lett. 21 2242-2244
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Abstract We investigate optical properties of dislocations in nitrogen-doped and nitrogen-free Czochralski silicon. The dislocations are formed during crystal growth, but not formed during deformation. The results show that in nitrogen-doped samples, a broad band replaced the D1 band of dislocation, regardless of dislocation density. The replacement of D1 band is caused by the non-irradiation combination induced by oxygen precipitation. Moreover, a new emission at 0.975eV is observed in both the nitrogen-free and doped samples when the dislocation density is lower than 104 cm-2.
Keywords: 61.72.Tt      61.72.Lk      78.55.-m     
Published: 01 November 2004
PACS:  61.72.Tt  
  61.72.Lk (Linear defects: dislocations, disclinations)  
  78.55.-m (Photoluminescence, properties and materials)  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y2004/V21/I11/02242
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LI Dong-Sheng
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