| Original Articles |
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Dependence of Structure and Haemocompatibility of Amorphous Carbon Films on Substrate Bias Voltage |
| GUO Yang-Ming;MO Dang;LI Zhe-Yi;LIU Yi;HE Zhen-Hui;CHEN Di-Hu |
| State Key Laboratory of Optoelectronic Materials and Technologies, Department of Physics, Sun Yat-Sen University, Guangzhou 510275 |
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| Cite this article: |
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GUO Yang-Ming, MO Dang, LI Zhe-Yi et al 2004 Chin. Phys. Lett. 21 2132-2135 |
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Abstract Tetrahedral amorphous hydrogenated carbon (ta-C:H) films on Si(100) substrates were prepared by using a magnetic-field-filter plasma stream deposition system. Samples with different ratios of sp3-bond to sp2-bond were obtained by changing the bias voltage applied to the substrates. The ellipsometric spectra of various carbon films in the photon energy range of 1.9--5.4eV were measured. The refractive index n and the relative sp3 C ratio of these films were obtained by simulating their ellipsometric spectra using the Forouhi--Bloomer model and by using the Bruggeman effective medium approximation, respectively. The haemocompatibility of these ta-C:H films was analysed by observation of platelet adhesion and measurement of kinetic clotting time. The results show that the sp3 C fraction is dependent on the substrate bias voltage, and the haemocompatibility is dependent on the ratio of sp3-bond to sp2-bond. A good haemocompatibility material of ta-C:H films with a suitable sp3 C fraction can be prepared by changing the substrate bias voltage.
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| Keywords:
07.60.Fs
68.55.-a
87.80.+s
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Published: 01 November 2004
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