| Original Articles |
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Hydrogenation Properties of Zr Films Under Various Conditions
of Hydrogen Plasma |
| YAN Guo-Qiang1;SHI Li-Qun1;ZHOU Zhu-Ying1;HAO Guo-Qing1;HU Pei-Gang1;LUO Shun-Zhong2;PENG Shu-Ming2;DING Wei2;LONG Xing-Gui2 |
| 1Applied Ion Beam Physics Laboratory, Institute of Modern Physics, Fudan University, Shanghai 200433
2Institute of Nuclear Physics and Chemistry, China Academy of Engineering Physics, Chengdu 610003
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| Cite this article: |
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YAN Guo-Qiang, SHI Li-Qun, ZHOU Zhu-Ying et al 2002 Chin. Phys. Lett. 19 775-778 |
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Abstract The hydrogenation properties of Zr samples with and without an Ni overlayer under various plasma conditions were investigated by means of non-Rutherford backscattering (non-RBS) and elastic recoil detection analysis. The theoretical maximum hydrogen capacity, 66.7at.%, could be achieved at a hydrogen absolute pressure of ～2 Pa and a substrate temperature of ～393 K for a plasma irradiation of only 10 min; this was significantly greater than that for gas hydrogenation under the same hydrogen pressure and substrate temperature. It was also found that the C and O contamination on the sample surface strongly influences the hydrogenation, and that the maximum equilibrium hydrogen content drops dramatically with the increasing total contamination. In addition, the influence of the Ni overlayer on the plasma hydrogenation is discussed.
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| Keywords:
07.30.Kf
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Published: 01 June 2002
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| PACS: |
07.30.Kf
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(Vacuum chambers, auxiliary apparatus, and materials)
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