Chin. Phys. Lett.  2001, Vol. 18 Issue (8): 1141-1143    DOI:
Original Articles |
Characterization of Microarc Oxidation Discharge Process for Depositing Ceramic Coating
YANG Guang-Liang;LÜ Xian-Yi;BAI Yi-Zhen;JIN Zeng-Sun
State Key Laboratory for Superhard Materials, Jilin University, Changchun 130023
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YANG Guang-Liang, LÜ, Xian-Yi et al  2001 Chin. Phys. Lett. 18 1141-1143
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Abstract The specific features of current variation during different stages of the microarc oxidation process were studied on the timescale. The cathodic current was found to be closely related to the microarc discharge. The discharge was responsible for the formation of a dense coating with unique physical characteristics. A method for obtaining high-quality coating has been discussed.
Keywords: 81.15.-z      82.45.Qr     
Published: 01 August 2001
PACS:  81.15.-z (Methods of deposition of films and coatings; film growth and epitaxy)  
  82.45.Qr (Electrodeposition and electrodissolution)  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y2001/V18/I8/01141
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