Microwave Absorption in Electron Cyclotron Resonance Plasma

Chin. Phys. Lett.

2000, Vol. 17

Issue (1): 31-33 DOI:

Original Articles

Microwave Absorption in Electron Cyclotron Resonance Plasma

LIU Ming-Hai^1,2;HU Xi-Wei²,WU Qin-Chong¹;YU Guo-Yang

¹Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031 ²Department of Modern Physics, University of Science and Technology of China, Hefei 230026

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LIU Ming-Hai, HU Xi-Wei, WU Qin-Chong et al 2000 Chin. Phys. Lett. 17 31-33

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Abstract The microwave power absorption in electron cyclotron resonance plasma reactor was investigated with a two-dimensional hybrid-code. Simulation results indicated that there are two typical power deposition profiles over the entire parameter region: (1) microwave power deposition peaks on the axis and decreases in radial direction, (2) microwave power deposition has its maximum at some radial position, i.e., a hollow distribution. The spatial distribution of electron temperature resembles always to the microwave power absorption profile. The dependence of plasma parameter on the gas pressure is discussed also.

Keywords: 52.65.-y 52.65.Pp 52.65.Rr 52.50.Gj

Published: 01 January 2000

PACS:	52.65.-y	(Plasma simulation)
	52.65.Pp	(Monte Carlo methods)
	52.65.Rr	(Particle-in-cell method)
	52.50.Gj	(Plasma heating by particle beams)

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y2000/V17/I1/031

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