| Original Articles |
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Effects of Chamber Pressure on Current-Voltage Characteristic of Metal-Insulator-Metal Element in Heat-Treating Anodized Ta2O5 Film
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| LIU Hong-wu1;GAO Chun-xiao1,2;WANG Hui1;CUI Qi-liang1;ZOU Guang-tian1;HUANG Xi-min3 |
| 1State Key Laboratory for Superhard Materials, Jilin University, Changchun 130023
2Institute of Physics, Chinese Academy of Sciences, Beijing 100080
3Changchun Institute of Physics, Chinese Academy of Sciences, Changcun 130021
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| Cite this article: |
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LIU Hong-wu, GAO Chun-xiao, WANG Hui et al 1999 Chin. Phys. Lett. 16 838-840 |
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Abstract Ta/anodized Ta2O5/Al is used as metal-insulator-metal (MIM) element in experiments, The current- voltage (I- V) characteristic of the MIM element depends on the chamber pressure in heat-treating anodized Ta2O5 film. Good nonlinear I- V characteristic has been obtained in the pressure range from 10-2 to 10-4 to Torr. Meanwhile, the conductivity coefficient α of the Poole-frenkel (PF) equation which describes the I- V characteristic can be regulated by about two orders of magnitude in this pressure range, while the non-linearity coefficient β of the PF equation is not affected by the chamber pressure.
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| Keywords:
73.40.Rw
72.20.Ht
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Published: 01 November 1999
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| PACS: |
73.40.Rw
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(Metal-insulator-metal structures)
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72.20.Ht
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(High-field and nonlinear effects)
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