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Polycrystalline β-C3N4 Thin Films Deposited on Single-Crystal KCl(100) Using rf Sputtering |
ZHANG Ze-bo;LI Yin-an;XIE Si-shen;YANG Guo-zhen |
Institute of Physics, Academia Sinica, Beijing 100080 |
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Cite this article: |
ZHANG Ze-bo, LI Yin-an, XIE Si-shen et al 1996 Chin. Phys. Lett. 13 69-72 |
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Abstract The carbon-nitride thin films were deposited on the (100) oriented single-crystal KCl wafers at ambient temperatures by using rf-plasma sputtering. The IR spectrum showed that the films contained carbon-nitride bonds. The transmission electron microscopy (TEM) and x.-ray diffraction (XRD) measurements indicated the existence of predicted polycrystalline β-C3N4 films on the KCl(I00) wafers. And the TEM and XRD measured lattice spacings well match the calculated data.
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Keywords:
81.15.Cd
68.55.Gi
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Published: 01 January 1996
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