| Original Articles |
|
|
|
|
Thermal Diffusivity of Diamond Films With Substrates |
| CUI Jingbiao;FANG Rongchuan |
| Department of Physics, Structure Research Laboratory, University of Science and Technology of China, Hefei 230026 |
|
| Cite this article: |
|
CUI Jingbiao, FANG Rongchuan 1995 Chin. Phys. Lett. 12 477-480 |
|
|
|
|
Abstract Diamond films were prepared by hot-filament chemical vapour deposition system. Photothermal deflection technique has been used to measure thermal diffusivity of diamond films with substrates. The influence of silicon or quartz substrate on the measurement of thermal diffusivity of film is presented. A simple two-layer model has been given to explain the effect of substrates on the measurement of thermal diffusivity and used to draw thermal diffusivity of diamond film from effective thermal diffusivity of film/substrate system.
|
| Keywords:
66.70.+f
|
|
|
Published: 01 August 1995
|
|
|
|
|
|
|
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
