Chin. Phys. Lett.  1991, Vol. 8 Issue (5): 244-247    DOI:
Original Articles |
Tilted Angle Implantation of Xe Ions in potassium Titanyl Phosphate
WANG Keming;SHI Borong;WANG Zhonglie;ZHAO Qingtai, LIU Xiangdong;LIU Jitian;LIU Yaogang*
Department of Physics, Shandong University, Jinan 250100 *Institute of Crystal Material, Shandong University, Jinan 250100
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WANG Keming, SHI Borong, WANG Zhonglie et al  1991 Chin. Phys. Lett. 8 244-247
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Abstract 200keV Xe ions were implanted in potassium titanyl phosphate (KTP) at deferent angles: 0°, 45° and 60°. The lateral spread of Xe ions in KTP was studied by Rutherford backscattering of 2.1 MeV He ions. The result is compared with the theoretical prediction. The lateral spread is found in good agreement with calculated value within 17 %.
Keywords: 61.70.Vn     
Published: 01 May 1991
PACS:  61.70.Vn  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y1991/V8/I5/0244
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WANG Keming
SHI Borong
WANG Zhonglie
ZHAO Qingtai
LIU Xiangdong
LIU Jitian
LIU Yaogang
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