Adsorption of CH<suB>3</suB>OD on Si(ll1) Surface at Different Temperatures

Chin. Phys. Lett.

1991, Vol. 8

Issue (4): 199-202 DOI:

Original Articles

Adsorption of CH₃OD on Si(ll1) Surface at Different Temperatures

WANG Zhuying;HUANG Hongwu;T. Hein^*;K. D. Brzoska^*

Department of Applied Physics, Hunan University, Changsha 410081 ^*Sektion Physik, K. M. Universität Leipzig, GDR

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WANG Zhuying, HUANG Hongwu, T. Hein et al 1991 Chin. Phys. Lett. 8 199-202

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Abstract Adsorption of deuterated methanol (CH₃ OD) on Si ( 111 ) surface has been studied at different temperatures by means of thermal desorption spectroscopy. For the adsorption temperature below 420°C, the desorption peak of hydrogen kept up almost unchanged at 510°C (±70°C). But the desorption peak temperature of hydrogen increased obviously for the adsorption temperature above 420°C. We have also found an interesting change in desorption energy of hydrogen.

Keywords: 68.35.Md 68.10.Jy 68. 45.Da

Published: 01 April 1991

PACS:	68.35.Md	(Surface thermodynamics, surface energies)
	68.10.Jy
	68. 45.Da

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y1991/V8/I4/0199

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	WANG Zhuying
	HUANG Hongwu
	T. Hein
	K. D. Brzoska

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