Chin. Phys. Lett.  1989, Vol. 6 Issue (8): 377-380    DOI:
Original Articles |
THE GROWTH OF e-BEAM EVAPORATED POLYCRYSTALLINE NICKEL FILM
ZHENG Tianshui;SHEN Yuanhua;WANG Wencheng;ZHANG Zhiming;WANG Zhijiang*
Laboratory of Laser Physics and Optics, Fudan University, Shanghai *Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, Shanghai
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ZHENG Tianshui, SHEN Yuanhua, WANG Wencheng et al  1989 Chin. Phys. Lett. 6 377-380
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Abstract The growth of nickel polycrystals in the e-beam evaporated Ni film was studied by electron diffraction and TEM image. The in-situ resistance measurements of Ni film deposited on different substrates show the minimum thickness to form a continuous Ni superficial layer.
Keywords: 8115Ef      6114Fe      6855+b     
Published: 01 August 1989
PACS:  8115Ef  
  6114Fe  
  6855+b  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y1989/V6/I8/0377
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ZHENG Tianshui
SHEN Yuanhua
WANG Wencheng
ZHANG Zhiming
WANG Zhijiang
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