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WORK FUNCTION AND ELECTRONIC STRUCTURE OF Co OVERLAYERS ON THE ION SPUTTERED BASAL FACE OF MoS2 SINGLE CRYSTAL |
| HU Yongjun;LIN Zhangda;XIE Kan;WU Naijuan |
| Institute of Physics, Academia Sinica, Beijing |
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| Cite this article: |
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HU Yongjun, LIN Zhangda, XIE Kan et al 1988 Chin. Phys. Lett. 5 169-172 |
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Abstract Work function and photoemission spectroscopy have been applied to the study of the interaction of Co overlayers with the ion sputtered basal face of MoS2(0001). The experimental results show that upon Co deposition the work function of the MoS2 substrate drops rapidly and reaches a minimum value of -0.65eV for ΔФ, and then increases to the metal Co work function at coverages greater than a monolayer. The Fermi level pinning at 2.2eV above the Mo 4dz2 peak has been found at a low submonolayer coverage.
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Published: 01 April 1988
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