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THE MECHANISM OF SURFACE SEGREGATION BY THE METHOD OF MECHANICAL POLISHING |
| CHEN Naiqun;ZHANG Qiangji;HUA Zhongyi |
| Modern Physics Institute, Fudan University, Shanghai |
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| Cite this article: |
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CHEN Naiqun, ZHANG Qiangji, HUA Zhongyi 1986 Chin. Phys. Lett. 3 129-132 |
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Abstract Mechanical polishing and subsequent thermal oxidation are the indispensable condition for rapid formation of a continuous and highly Cr-enriched layer on the surface of a Ni-Cr alloy. Direct observations of the Cr distribution on the surface by Auger map show a possible process for Cr segregation. The huge amount of grain boundaries created by mechanical polishing promote the upward diffusion of Cr. Selective oxidation and Cr-holding effect also speed up the formation of Cr2O3.
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Published: 01 March 1986
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