Chin. Phys. Lett.  1986, Vol. 3 Issue (2): 65-68    DOI:
Original Articles |
ACTIVATION ENERGY OF ELECTROMIGRATION IN THIN METAL FILMS
WANG Qimin;WU Yunzhong;SUN Chenglong
Shanghai Institute of Metallurgy, Academia Sinica, Shanghai
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WANG Qimin, WU Yunzhong, SUN Chenglong 1986 Chin. Phys. Lett. 3 65-68
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Abstract A new method for measuring the activation energy of electromigration in thin metal films has been established.
Published: 01 February 1986
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