%A Zhao-Zhao Hou, Gui-Lei Wang, Jin-Juan Xiang, Jia-Xin Yao, Zhen-Hua Wu, Qing-Zhu Zhang, Hua-Xiang Yin %T Improved Operation Characteristics for Nonvolatile Charge-Trapping Memory Capacitors with High-$\kappa$ Dielectrics and SiGe Epitaxial Substrates %0 Journal Article %D 2017 %J Chin. Phys. Lett. %R 10.1088/0256-307X/34/9/097304 %P 097304%V 34 %N 9 %U {https://cpl.iphy.ac.cn/CN/abstract/article_70936.shtml} %8 2017-08-08 %X A novel high-$\kappa$ Al$_{2}$O$_{3}$/HfO$_{2}$/Al$_{2}$O$_{3}$ nanolaminate charge trapping memory capacitor structure based on SiGe substrates with low interface densities is successfully fabricated and investigated. The memory capacitor exhibits excellent program-erasable characteristics. A large memory window of $\sim $4 V, a small leakage current density of $\sim $2 $\times$ 10$^{-6}$ Acm$^{-2}$ at a gate voltage of 7 V, a high charge trapping density of $1.42\times 10^{13}$ cm$^{-2}$ at a working voltage of $\pm$10 V and good retention characteristics are observed. Furthermore, the programming ($\Delta V_{\rm FB}=2.8$ V at 10 V for 10 μs) and erasing speeds ($\Delta V_{\rm FB}=-1.7$ V at $-$10 V for 10 μs) of the fabricated capacitor based on SiGe substrates are significantly improved as compared with counterparts reported earlier. It is concluded that the high-$\kappa$ Al$_{2}$O$_{3}$/HfO$_{2}$/Al$_{2}$O$_{3}$ nanolaminate charge trapping capacitor structure based on SiGe substrates is a promising candidate for future nano-scaled nonvolatile flash memory applications.