| CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
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Simulation of Interference Nanolithography of Second-Exciting Surface-Plasmon Polartions for Metal Nanograting Fabrication |
| LIANG Hui-Min1**, WANG Jing-Quan2
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1College of Science, Hebei University of Engineering, Handan 056038
2Department of Physics, Sichuan University, Chengdu 610064
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| Cite this article: |
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LIANG Hui-Min, WANG Jing-Quan 2011 Chin. Phys. Lett. 28 018101 |
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Abstract Second-exciting surface-polasmon-polariton (SPP) interference lithography (SE-SPPIL) designed by an improving attenuated total reflection (ATR) mode is suggested for fabricating metal nanograting. A metal film coated under a prism excites SPP first, and then the SPP energy transmits into another metal film and launches SPP again. An interlayer between two metal films is a thin resist coated on the second metal film. An interference nanopattern is formed in the resist when two SPP waves are launched symmetrically. After development, chemical or physical etching, the nanopattern is transferred into the metal film. A random thickness metal grating can be achieved as the thickness of the second metal film does not influence the interference pattern intensity. This scheme is promising for fabricating metal nanograting at low cost.
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| Keywords:
81.16.Nd
42.25.Hz
52.35.Hr
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Received: 22 June 2010
Published: 23 December 2010
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| PACS: |
81.16.Nd
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(Micro- and nanolithography)
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42.25.Hz
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(Interference)
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52.35.Hr
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(Electromagnetic waves (e.g., electron-cyclotron, Whistler, Bernstein, upper hybrid, lower hybrid))
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