| CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
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Nano-Crystalline Diamond Films Grown by Radio-Frequency Inductively Coupled Plasma Jet Enhanced Chemical Vapor Deposition |
| SHI Yan-Chao1, LI Jia-Jun1, LIU Hao1, ZUO Yong-Gang1, BAI Yang1, SUN Zhan-Feng2,3, MA Dian-Li2,3, CHEN Guang-Chao1,3** |
1College of Materials Sciences and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049
2KYKY Technology Co., Ltd., Beijing 100190
3Joint Laboratory of Electron Microscope Technology, Beijing 100049
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| Cite this article: |
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SHI Yan-Chao, LI Jia-Jun, LIU Hao et al 2015 Chin. Phys. Lett. 32 088104 |
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Abstract Radio-frequency inductively coupled plasma jet is utilized to grow diamond films to combine the advantages of clean deposition environment and large deposition area. Before diamond growth, the simulation of deposition environment is studied to understand the flow field and the properties of the plasma. The optical emission spectra (OES) are also applied to diagnose the rf plasma. The plasma density ne and the electron temperature Te deduced from the data measured by OES are about 1.0×1014 l/cm3 and 1.4 eV, which are in good agreement with the data calculated in the simulation. Based on the data from both simulation and measurement, the optimized growth parameters are determined to grow diamond films. Nano-crystalline diamond with cauliflower-like morphology is obtained. The crystalline feature and impurity of as-grown films are also studied.
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Received: 18 March 2015
Published: 02 September 2015
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| PACS: |
81.05.uj
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(Diamond/nanocarbon composites)
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81.15.Gh
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(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
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52.80.Pi
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(High-frequency and RF discharges)
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47.11.Fg
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(Finite element methods)
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47.15.Cb
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(Laminar boundary layers)
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