| CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES |
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Crystallization Kinetics Study on Magnetron-Sputtered Amorphous TiAl Alloy Thin Films |
| SHUI Lu-Yu, YAN Biao** |
School of Materials Science and Engineering, Tongji University, Shanghai 201804 Shanghai Key Lab of D&A for Metal-Functional Materials, Shanghai 201804
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| Cite this article: |
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SHUI Lu-Yu, YAN Biao 2014 Chin. Phys. Lett. 31 046103 |
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Abstract Crystallization kinetics of magnetron-sputtered amorphous TiAl alloy thin films is investigated by differential scanning calorimetry through isothermal analysis and non-isothermal analysis. In non-isothermal analysis, the Kissinger method and the Ozawa method are used to calculate the apparent activation energy and local activation energy, respectively, in the crystallization processes of amorphous TiAl thin films. Furthermore, the crystallization mechanism is discussed from the investigation of the Avrami exponent by isothermal analysis. In addition, x-ray diffraction is utilized to reveal the grain orientation and evolution during the crystallization of TiAl thin films.
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Received: 31 October 2013
Published: 25 March 2014
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| PACS: |
61.43.Dq
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(Amorphous semiconductors, metals, and alloys)
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64.60.-i
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(General studies of phase transitions)
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64.70.kd
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(Metals and alloys)
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