| PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
|
|
|
|
Self-Adjusting Characterization for Steady-State, Direct Current Cathode-Dominated Glow Discharge Plasmas at High Pressures |
| DING Fang1,2, ZHENG Shi-Jian1, KE Bo1, TANG Zhong-Liang1, ZHANG Yi-Chuan1, YANG Kuan1, XIE Xin-Hua1, ZHU Xiao-Dong1** |
1CAS Key Laboratory of Basic Plasma Physics, Department of Modern Physics, University of Science and Technology of China, Hefei 230026
2Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031
|
|
| Cite this article: |
|
DING Fang, ZHENG Shi-Jian, KE Bo et al 2013 Chin. Phys. Lett. 30 085201 |
|
|
|
|
Abstract A steady-state, direct-current high-pressure CH4-H2 glow discharge in a cup-shaped cathode parallel to anode configuration is investigated by using their V–I characteristics and CCD images. The discharges display an abnormal glow feature, and an expansion of a negative glow is observed on the cathode sidewall with the increasing discharge current. There exists a dependence of voltage on gas pressure for different fixed currents. The voltage decreases with gas pressure initially, and then increases conversely, which is correlated with the glow states of the cathode sidewall. This study exhibits a self-adjusting characterization for plasmas in cathode fall, which is important for maintaining steady-state, abnormal glow discharge in a relatively high pressure range.
|
|
|
Received: 03 May 2013
Published: 21 November 2013
|
|
| PACS: |
52.70.Ds
|
(Electric and magnetic measurements)
|
| |
52.70.Kz
|
(Optical (ultraviolet, visible, infrared) measurements)
|
| |
52.40.Kh
|
(Plasma sheaths)
|
| |
52.77.Fv
|
(High-pressure, high-current plasmas)
|
| |
52.80.Hc
|
(Glow; corona)
|
|
|
|
|
|
[1] Sciortino S, Lagomarsino S, Pieralli F, Borchi E and Galvanetto E 2002 Diamond Relat. Mater. 11 573
[2] Lee S, Baik Y J and Chae K W 2003 Thin Solid Films 435 89
[3] Ding F, Zhu X D, Zhan R J, Ni T L and Ke B 2009 Appl. Phys. Lett. 95 121501
[4] Kunhardt E E 2000 IEEE Trans. Plasma Sci. 28 189
[5] Lee W S, Chae K W, Eun K Y and Baik Y J 2001 Diamond Relat. Mater. 10 2220
[6] Phelps A V 2001 Plasma Sources Sci. Technol. 10 329
[7] Takaki K, Taguchi D and Fujiwara T 2001 Appl. Phys. Lett. 78 2646
[8] Schoenbach K H and Chen A 1990 J. Appl. Phys. 67 154
[9] Hash D, Bose D, Govindan T R and Meyyappan M 2003 J. Appl. Phys. 93 6284
[10] Bektursunova R M and Graham W G 2000 Phys. Plasmas 7 1331
[11] Borysow J and Phelps A V 1994 Phys. Rev. E 50 1399 |
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
