| CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES |
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Spectral Resolution Improvement of Mo/Si Multilayers |
| WU Wen-Juan1**, WANG Zhan-Shan2, ZHU Jing-Tao2, ZHANG Zhong2, WANG Feng-Li2, CHEN Ling-Yan2, ZHOU Hong-Jun3, HUO Tong-Lin3
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1College of Sciences, Shanghai Institute of Technology, Shanghai 201418
2Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092
3National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029
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| Cite this article: |
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WU Wen-Juan, WANG Zhan-Shan, ZHU Jing-Tao et al 2011 Chin. Phys. Lett. 28 086801 |
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Abstract Theoretically, the spectral resolution of a multilayer can be improved through a combination of utilizing high reflectance orders and by decreasing the thickness of the scattering layer. We fabricate Mo/Si multilayers in the first, second, third, fourth and fifth reflectance orders with Mo layer thicknesses of 3.0 nm and 2.0 nm, respectively, using direct current magnetron sputtering. The structure of the multilayers is characterized with a grazing angle x-ray diffractometer (XRD). Then the reflectivity of the multilayers is measured in a synchrotron radiation facility. The results show that the spectral resolution increases with the increasing reflectance order and with the decreasing Mo layer thickness. The highest spectral resolution is improved to 117.5 in the 5th order for dMo=2 nm, where the reflectivity is 18%.
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| Keywords:
68.65.Ac
81.15.Cd
95.85.Mt
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Received: 14 May 2011
Published: 28 July 2011
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