Chin. Phys. Lett.  2010, Vol. 27 Issue (9): 094205    DOI: 10.1088/0256-307X/27/9/094205
FUNDAMENTAL AREAS OF PHENOMENOLOGY(INCLUDING APPLICATIONS) |
Enhanced Surface-Plasmon-Polariton Interference for Nanolithography by a Micro-Cylinder-Lens Array

LIANG Hui-Min1, WANG Jing-Quan2, FAN Feng1, QIN Ai-Li1, ZHANG Chun-Yuan1, CHENG Hui1

1College of Science, Hebei University of Engineering, Handan 056038 2College of Physical Science and Technology, Sichuan University, Chengdu 610064
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LIANG Hui-Min, WANG Jing-Quan, FAN Feng et al  2010 Chin. Phys. Lett. 27 094205
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Abstract

A practical interference lithography scheme based on surface plasmon polaritions (SPPs) is suggested. In this scheme, a micro-cylinder-lens array is employed to generate the evanescent wave (EW) carrying much energy. When the top of the cylinder lenses are in close contact with a metal film coated on a resist, the energy of EW will launch strong SPPs and form enhanced interference nanopatterns in the resist. The simulation results confirm that a high quality nanopattern with a critical dimension of λ/7 can be achieved in the resistance. The analysis results indicate that the height of the cylinder lenses can provide a large tolerance to decrease the fabrication difficulty of this element.

Keywords: 42.79.-e      42.25.Hz      52.35.Hr     
Received: 19 April 2010      Published: 25 August 2010
PACS:  42.79.-e (Optical elements, devices, and systems)  
  42.25.Hz (Interference)  
  52.35.Hr (Electromagnetic waves (e.g., electron-cyclotron, Whistler, Bernstein, upper hybrid, lower hybrid))  
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https://cpl.iphy.ac.cn/10.1088/0256-307X/27/9/094205       OR      https://cpl.iphy.ac.cn/Y2010/V27/I9/094205
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LIANG Hui-Min
WANG Jing-Quan
FAN Feng
QIN Ai-Li
ZHANG Chun-Yuan
CHENG Hui
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