| CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES |
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Zr-Cu Amorphous Films Prepared by Magnetron Co-sputtering Deposition of Pure Zr and Cu |
| JING Qin, XU Yong, ZHANG Xin-Yu, LI Gong, LI Li-Xin, XU Zhe, MA Ming-Zhen, LIU Ri-Ping |
| State Key Laboratory of Metastable Materials Science and Technology, Yanshan University, Qinhuangdao 066004 |
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| Cite this article: |
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JING Qin, XU Yong, ZHANG Xin-Yu et al 2009 Chin. Phys. Lett. 26 086109 |
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Abstract ZrxCu100-x amorphous films are prepared on Si (111) substrates by magnetron co-sputtering of pure Zr and Cu. It is found that the glass forming ability (GFA) of the films increases with x when x is in the range from 35 to 65 and with the best glass forming ability at x=65. It is therefore different from the bulk counterparts, for which only x=35 and 50 were reported to have high glass forming ability during casting. The structure of the films is sensitive to the substrate temperature and the sputtering argon pressure.
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| Keywords:
61.43.Dq
81.15.Cd
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Received: 11 February 2009
Published: 30 July 2009
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| PACS: |
61.43.Dq
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(Amorphous semiconductors, metals, and alloys)
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81.15.Cd
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(Deposition by sputtering)
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