| PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
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Ultra-Thin Silicon Carbon Nitride Film: a Promising Protective Coating for Read/Write Heads in Magnetic Storage Devices |
| GAO Peng1, XU Jun2, DING Wan-Yu2, DONG Chuang2 |
| 1Faculty of Materials and Metallurgical Engineering, Kunming University of Science and Technology, Kunming 6500932State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024 |
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| Cite this article: |
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GAO Peng, XU Jun, DING Wan-Yu et al 2009 Chin. Phys. Lett. 26 065203 |
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Abstract Ultra-thin amorphous Si-C-N films, down to 2nm, have been synthesized by MW-ECR plasma enhanced unbalanced magnetron sputtering. The friction coefficient of the film is only 0.11, determined in dry friction tests against the GCr15 ball at a load of 400mN for 20min. The films exhibit good protection against corrosion when they are immersed in a more severe corrosion environment of 0.1mol/L oxalic acid for 12h compared to the usual conditions (0.05mol/L, 4min) used in current computer industries. These good properties can be attributed to the smooth, dense and pore free structure of the film. These indicate that the Si-C-N film synthesized by the present technique may be a promising protective coating for read/write heads and other magnetic storage devices.
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| Keywords:
52.77.Dq
81.15.Cd
81.65.Kn
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Received: 04 January 2009
Published: 01 June 2009
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| PACS: |
52.77.Dq
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(Plasma-based ion implantation and deposition)
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81.15.Cd
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(Deposition by sputtering)
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81.65.Kn
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(Corrosion protection)
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