Chin. Phys. Lett.  2009, Vol. 26 Issue (2): 028104    DOI: 10.1088/0256-307X/26/2/028104
CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
Finite Element Analysis of Convection in Growth Cell for Diamond Growth Using Ni-Based Solvent
TIAN Yu1, JIA Xiao-Peng1, ZANG Chuan-Yi2, LI Rui3, LI Shang-Sheng1, XIAO Hong-Yu1, ZHANG Ya-Fei1, HUANG Guo-Feng1, HAN Qi-Gang1, MA Li-Qiu1, LI Yong1, CHEN Xiao-Zhou2, ZHANG Cong1, MA Hong-An
1State Key Lab of Superhard Materials, Jilin University, Changchun 1300122Henan Polytechnic University, Jiaozuo 4540003Changchun University of Science and Technology, Changchun 130012
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TIAN Yu, JIA Xiao-Peng, ZANG Chuan-Yi et al  2009 Chin. Phys. Lett. 26 028104
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Abstract Thermal-electrical-fluid coupled finite element analyses are performed in the model of the growth cell in a high-pressure and high-temperature (HPHT) cubic apparatus in which the large diamond crystal can be grown by using Ni-based solvent with temperature gradient method (TGM). The convection in the Ni-based solvent with different thicknesses at 1700-1800K is simulated by finite element method (FEM). The experiments of diamond crystal growth are also carried out by using Ni-based solvent at 5.7GPa and 1700-1800K in a China-type cubic high pressure apparatus (CHPA). The simulation results show that the Rayleigh number in the solvent is enhanced obviously with the increasing solvent thickness. Good quality diamond single crystal cannot be grown if the Rayleigh number in the solvent is too high.
Keywords: 81.05.Uw      81.10.Aj      81.10.Dn      81.10.-h     
Received: 24 September 2008      Published: 20 January 2009
PACS:  81.05.Uw  
  81.10.Aj (Theory and models of crystal growth; physics and chemistry of crystal growth, crystal morphology, and orientation)  
  81.10.Dn (Growth from solutions)  
  81.10.-h (Methods of crystal growth; physics and chemistry of crystal growth, crystal morphology, and orientation)  
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https://cpl.iphy.ac.cn/10.1088/0256-307X/26/2/028104       OR      https://cpl.iphy.ac.cn/Y2009/V26/I2/028104
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TIAN Yu
JIA Xiao-Peng
ZANG Chuan-Yi
LI Rui
LI Shang-Sheng
XIAO Hong-Yu
ZHANG Ya-Fei
HUANG Guo-Feng
HAN Qi-Gang
MA Li-Qiu
LI Yong
CHEN Xiao-Zhou
ZHANG Cong
MA Hong-An
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